The course will cover the fabrication process and the inspection techniques of semiconductors. It is an introduction to the fundamentals of micro- and nano-fabrication processes with emphasis on cleanroom practices.

It will cover: 1) The physical principles of optical lithography, electron-beam lithography, alternative nanolithography techniques, and thin film deposition and metrology methods; 2) the physical and chemical processes of wet and dry etching; 3) cleanroom concepts and safety protocols; 4) sequential micro-fabrication processes involved in the manufacture of microelectronic and photonic devices; 5) metrology, imaging, and characterization of micro- and nano-structures; and 6) examples of practical existing and emerging micro- and nano-devices.

Emphasis will be hands-on learning, and 50 % of the contact hours will lab sessions. Students divided in small groups will use the tools and equipment at the Toronto Nanofabrication Centre (TNFC) and the Open Centre for the Characterization of Advanced Materials (OCCAM).

This is a graduate-level technical course which can be used by MEng, MASc, and PhD students towards their degree requirements in MSE and ECE.